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As layers of materials are sequentially deposited and removed, the uppermost surface of the substrate, i.e., the exposed surface of the substrate, becomes non-planar. Regardless of whether a particular surface is planar, a peak-to-valley distance, (i.e., a difference between a maximum height and a minimum height in the surface), of a patterned layer may range from about 5 microns to about 1,000 microns or more. Layer thickness non-uniformity across the wafer may also result in such surface topography. In semiconductor manufacturing, it is generally desirable to perform the above process as many times as possible on a single wafer to achieve as many die on the wafer as possible. As a result of the topography of the exposed surface and/or layer thickness non-uniformity, photoresist and other layers formed on the wafer surface can be thinned or even completely removed, especially in regions of the wafer where the distances between adjacent die are less than about 5 microns. Photoresist and other materials can also be thinned or removed in semiconductor manufacturing by a process known as chemical-mechanical polishing (CMP). CMP typically involves holding a wafer in a slurry against a polishing pad under controlled chemical, pressure, and temperature conditions. Polishing pad materials are generally hard and relatively abrasive. The slurry is generally acidic and can contain abrasive materials such as alumina, silica or ceria. Such abrasive materials can cause undesired topographical changes in the wafer surface. The wafer surface may also be cleaned to remove excess slurry before and/or after polishing the wafer. Cleaning slurry and excess chemical material can also be abrasive and can undesirably alter the topography of the wafer surface. In view of the above, there What's New in the? Ronald Cuberli Ronald Cuberli (born 1 July 1963 in Basel) is a former Swiss slalom canoeist who competed from the late 1980s to the late 1990s. He won four medals in the C-2 team event at the ICF Canoe Slalom World Championships with a gold (1993), a silver (1995), and two bronzes (1991, 1995). He also won two golds (C-2 team event: 1995, 1997), a silver (C-2 team event: 1997), and a bronze (C-2 team event: 1991) at the 1996 European Championships in Plovdiv. He also competed in three Summer Olympics, earning his best finish of eighth in the C-2 event at Barcelona in 1992. World Cup individual podiums References Sports-Reference.com profile Category:1963 births Category:Canoeists at the 1992 Summer Olympics Category:Canoeists at the 1996 Summer Olympics Category:Living people Category:Olympic canoeists of Switzerland Category:Swiss male canoeists Category:Medalists at the ICF Canoe Slalom World ChampionshipsQ: How to refresh UI each time the application starts with React Native I'm developing an application with React-Native. 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